DATE | HS_CODE | Product Description | Trademark | Country | Net Weight | Statistical Cost | Place | Shipper Name | Consignee Name |
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2017-09-01 | 2811220000 | SILICON DIOXIDE powdered, RAW MATERIALS FOR COSMETICS PROM-TI, GROSS WEIGHT 20471KG from the pallet,: __ 1.0__ "TIXOSIL 73" in bags of 20kg ON 22 PALLETS -990 PCS. __1.1__ manufacturer -RHODIA OPERATIONS brand -RHODIA brand -RHODIA -TIXOSIL article 73 count | RHODIA | FRANCE | 19800 | 27573,51 | Collon | ***** | ***** |
2017-09-01 | 2811220000 | SILICON DIOXIDE powdered, RAW MATERIALS FOR COSMETICS PROM-TI, GROSS WEIGHT 20471KG from the pallet,: "TIXOSIL 73" in bags of 20kg ON 22 PALLETS -990 PCS. RHODIA OPERATIONS RHODIA RHODIA TIXOSIL 73 19800 | *** | FRANCE | 19800 | 27573,51 | *** | ***** | ***** |
2017-09-04 | 2811220000 | SILICON DIOXIDE powdered, RAW MATERIALS FOR COSMETICS PROM-TI, GROSS WEIGHT 22332KG from the pallet,: __ 1.0__ "TIXOSIL 73" in bags of 20kg ON 24 PALLETS -1080 PCS. __1.1__ manufacturer -RHODIA OPERATIONS brand -RHODIA brand -RHODIA -TIXOSIL Article 73 in number | RHODIA | FRANCE | 21600 | 29958,82 | Collon | ***** | ***** |
2017-09-04 | 2811220000 | SILICON DIOXIDE powdered, RAW MATERIALS FOR COSMETICS PROM-TI, GROSS WEIGHT 22332KG from the pallet,: "TIXOSIL 73" in bags of 20kg ON 24 PALLETS -1080 PCS. RHODIA OPERATIONS RHODIA RHODIA TIXOSIL 73 21600 | *** | FRANCE | 21600 | 29958,82 | *** | ***** | ***** |
2017-09-06 | 2801100000 | CHLORINE (CL2), IN THE FORM OF LPG, used for production of integrated circuits in the electronics industry, does not contain. SOURCES OF RADIATION: __ 1.0__ CHLORO (CL2; CHORINE, NUMBER CAS 7782-50-5), of purity of 99.999%, in metal cylinders | AIR LIQUIDE | FRANCE | 100 | 3788,68 | CHALON SUR SAONE | ***** | ***** |
2017-09-06 | 2814100000 | Ammonia (NH3), IN THE FORM OF LPG, used for production of integrated circuits in the electronics industry, does not contain. RADIATION SOURCE: __ 1.0__ ammonia (NH3; AMMONIA, NUMBER CAS 7664-41-7), of purity of 99.999%, in metal cylinders | AIR LIQUIDE | FRANCE | 25 | 410,45 | CHALON SUR SAONE | ***** | ***** |
2017-09-06 | 2811293000 | NITROGEN OXIDE NO (nitric oxide) in the form of compressed gas, used for production of integrated circuits in the electronics industry, does not contain. RADIATION SOURCE: NITRIC OXIDE (NO) NITRIC OXIDE, purity 99.9% (No. CAS 10102-43-9), In | *** | FRANCE | 2.5 | 513,62 | *** | ***** | ***** |
2017-09-06 | 2804300000 | A mixture of inert gases, in the form of compressed gas, used for production of integrated circuits in the electronics industry, does not contain. RADIATION SOURCE: GAS MIXTURE: 1.2% HE / N2 - a mixture of helium (HE) 99.9995% of purity (1.2% CONTENTS NUMBER | *** | FRANCE | 86 | 2556,46 | *** | ***** | ***** |
2017-09-06 | 2801100000 | CHLORINE (CL2), IN THE FORM OF LPG, used for production of integrated circuits in the electronics industry, does not contain. RADIATION SOURCE: chlorine (CL2; CHORINE, NUMBER CAS 7782-50-5), of purity of 99.999%, in metal cylinders B50 AI | *** | FRANCE | 100 | 3788,68 | *** | ***** | ***** |
2017-09-06 | 2812900000 | Nitrogen trifluoride (NF3), IN THE FORM OF LPG, used for production of integrated circuits in the electronics industry, does not contain. RADIATION SOURCE: nitrogen trifluoride (NF3; NITROGEN TRIFLUORIDE, NUMBER CAS 7783-54-2), 99.99 | *** | FRANCE | 286 | 18823,85 | *** | ***** | ***** |