DATE | HS_CODE | Product Description | Trademark | Country | Net Weight | Statistical Cost | Place | Shipper Name | Consignee Name |
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2017-09-05 | 8486909003 | Parts and accessories for apparatus for the manufacture of the device by projection or drawing of circuit patterns on sensitized SEMICONDUCTOR MATERIALS: photomask is made from polished quartz glasses, are on Chemical Composition | *** | ITALY | 1.4 | 3037,64 | *** | ***** | ***** |
2017-09-07 | 8486909003 | Parts and accessories for apparatus for the manufacture of the device by projection or drawing of circuit patterns on sensitized SEMICONDUCTOR MATERIALS: photomask is made from polished quartz glasses, are on Chemical Composition | *** | ITALY | 17.5 | 116620,46 | *** | ***** | ***** |
2017-09-14 | 8486909003 | Parts and accessories for apparatus for the manufacture of the device by projection or drawing of circuit patterns on sensitized SEMICONDUCTOR MATERIALS: photomask is made from polished quartz glasses, are on Chemical Composition | *** | ITALY | 20.3 | 58758,36 | *** | ***** | ***** |
2017-09-15 | 8486209005 | INSTALLATION OF DOUBLE-SIDED COMBINATION AND EXPOSURE, used for accurate registration of images on the mask and the wafer front and back side as well as carry out the process under controlled EXPOSURE DOSE UV ILD STATUS | *** | UNITED STATES | 415 | 80915,85 | *** | ***** | ***** |
2017-09-22 | 8486909003 | Parts and accessories for apparatus for the manufacture of the device by projection or drawing of circuit patterns on sensitized SEMICONDUCTOR MATERIALS: photomask is made from polished quartz glasses, are on Chemical Composition | *** | ITALY | 9.1 | 22699,31 | *** | ***** | ***** |
2017-09-22 | 8486909003 | Interferometer RBE CEP. Number 22M136 TOTAL: INSTALLATION BEZMASKOVOY LITHOGRAPHY SYSTEMS DWL 66FS (. ZAV â„– DWL635), applied to technologies for manufacturing semiconductors HEIDELBERG INSTRUMENTS MIKROTECHNIK GMBH HIMT RLU10 1 | *** | UNITED KINGDOM | 2.8 | 13922,6 | *** | ***** | ***** |
2017-09-28 | 8486909003 | Parts and accessories for apparatus for the manufacture of the device by projection or drawing of circuit patterns on sensitized SEMICONDUCTOR MATERIALS: photomask is made from polished quartz glasses, are on Chemical Composition | *** | ITALY | 5.6 | 13225,32 | *** | ***** | ***** |
2017-10-04 | 8486909008 | PARTS EXCLUSIVELY intended for installation JUSUNG GENAON PLUS ETCHING hard mask and the magnetic layers with plasma silicon wafers IN SEMICONDUCTOR MANUFACTURING: | JUSUNG | *** | 150 | 50319,93 | Gyeonggi | ***** | ***** |
2017-10-04 | 8486909008 | PARTS EXCLUSIVELY intended for installation JUSUNG GENAON PLUS ETCHING hard mask and the magnetic layers with plasma silicon wafers IN SEMICONDUCTOR MANUFACTURING: | JUSUNG | *** | 150 | 50319,93 | Gyeonggi | ***** | ***** |
2017-10-05 | 8486909008 | PARTS EXCLUSIVELY intended for installation JUSUNG GENAON PLUS ETCHING hard mask and the magnetic layers with plasma silicon wafers IN SEMICONDUCTOR MANUFACTURING: | JUSUNG | KOREA REPUBLIC OF | 0.2 | 3312,78 | Gyeonggi | ***** | ***** |