DATE | HS_CODE | Product Description | Trademark | Country | Net Weight | Statistical Cost | Place | Shipper Name | Consignee Name |
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2017-09-05 | 8486909003 | Parts and accessories for apparatus for the manufacture of the device by projection or drawing of circuit patterns on sensitized SEMICONDUCTOR MATERIALS: photomask is made from polished quartz glasses, are on Chemical Composition | *** | ITALY | 1.4 | 3037,64 | *** | ***** | ***** |
2017-09-07 | 8486909003 | Parts and accessories for apparatus for the manufacture of the device by projection or drawing of circuit patterns on sensitized SEMICONDUCTOR MATERIALS: photomask is made from polished quartz glasses, are on Chemical Composition | *** | ITALY | 17.5 | 116620,46 | *** | ***** | ***** |
2017-09-14 | 8486909003 | Parts and accessories for apparatus for the manufacture of the device by projection or drawing of circuit patterns on sensitized SEMICONDUCTOR MATERIALS: photomask is made from polished quartz glasses, are on Chemical Composition | *** | ITALY | 20.3 | 58758,36 | *** | ***** | ***** |
2017-09-22 | 8486909003 | Parts and accessories for apparatus for the manufacture of the device by projection or drawing of circuit patterns on sensitized SEMICONDUCTOR MATERIALS: photomask is made from polished quartz glasses, are on Chemical Composition | *** | ITALY | 9.1 | 22699,31 | *** | ***** | ***** |
2017-09-22 | 8486909003 | Interferometer RBE CEP. Number 22M136 TOTAL: INSTALLATION BEZMASKOVOY LITHOGRAPHY SYSTEMS DWL 66FS (. ZAV â„– DWL635), applied to technologies for manufacturing semiconductors HEIDELBERG INSTRUMENTS MIKROTECHNIK GMBH HIMT RLU10 1 | *** | UNITED KINGDOM | 2.8 | 13922,6 | *** | ***** | ***** |
2017-09-28 | 8486909003 | Parts and accessories for apparatus for the manufacture of the device by projection or drawing of circuit patterns on sensitized SEMICONDUCTOR MATERIALS: photomask is made from polished quartz glasses, are on Chemical Composition | *** | ITALY | 5.6 | 13225,32 | *** | ***** | ***** |
2017-10-21 | 8486909003 | INSTALLATION OF LASER LITHOGRAPHY BEZMASKOVOY MODELS DWL 66FS (ZAV. DWL 612) SET serves for formation of topological structures on the metallized photomasks IF integrated circuits, hybrid integrated circuits, NOT WAR | HIMT | *** | 2.2 | 13976,99 | HEIDELBERG | ***** | ***** |
2017-10-21 | 8486909003 | INSTALLATION OF LASER LITHOGRAPHY BEZMASKOVOY MODELS DWL 66FS (ZAV. DWL 612) SET serves for formation of topological structures on the metallized photomasks IF integrated circuits, hybrid integrated circuits, NOT WAR | HIMT | *** | 2.8 | 10791,19 | HEIDELBERG | ***** | ***** |
2017-10-21 | 8486909003 | INSTALLATION OF LASER LITHOGRAPHY BEZMASKOVOY MODELS DWL 66FS (ZAV. DWL 612) SET serves for formation of topological structures on the metallized photomasks IF integrated circuits, hybrid integrated circuits, NOT WAR | HIMT | *** | 2.2 | 13976,99 | HEIDELBERG | ***** | ***** |
2017-10-21 | 8486909003 | INSTALLATION OF LASER LITHOGRAPHY BEZMASKOVOY MODELS DWL 66FS (ZAV. DWL 612) SET serves for formation of topological structures on the metallized photomasks IF integrated circuits, hybrid integrated circuits, NOT WAR | HIMT | *** | 2.8 | 10791,19 | HEIDELBERG | ***** | ***** |